Method for fabricating semiconductor integrated circuit device

Details Method for fabricating semiconductor integrated circuit device Method for fabricating semiconductor integrated circuit device

2005-10-11

2005-10-11

Chaudhuri, Olik (Department: 2823)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

C438S010000, C438S017000

Reexamination Certificate

active

06953696

ABSTRACT:
A method for fabricating a semiconductor integrated circuit device of the present invention forms an insulating film on a semiconductor wafer and forms a mask pattern containing a functional element or a wire on the formed insulating film. Dimensions of the mask pattern are changed in accordance with an amount of process variation occurring in the thickness or dielectric constant of the insulating film during the formation of the insulating film.

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