Method for fabricating quantum wire laser diode

Fishing – trapping – and vermin destroying

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437 90, 437129, H01L 2120

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active

054533988

ABSTRACT:
Disclosed is a fabricating method of a quantum wire laser diode, comprising the steps of preparing a GaAs substrate; sequentially forming n-type epitaxial layers and a first photoresist layer on the GaAs substrate; removing a portion of the intrinsic GaAs layer by using a first etching solution, and then removing the photoresist layer; wet-etching away a portion of the intrinsic AlAs layer in the vicinity of the opening by using a second etching solution; growing a quantum structure in the molecular beam epitaxy apparatus to form a multiple quantum well on the intrinsic GaAs layer and form a quantum wire on the n-type energy band slope layer through the opening; removing the quantum well, the intrinsic GaAs layer and the intrinsic AlAs layer simultaneously by using a third etching solution; sequentially forming a p-type energy band slope layer, a p-type cladding layer and a p.sup.+ -GaAs layer, on the n-type energy band slope layer and the quantum wire, and forming a second photoresist layer having a predetermined pattern on the p.sup.+ -GaAs layer; removing the layers laminated on the n-type resistive contact layer using the second photoresist layer patterned thus as an etching mask and then removing the second photoresist layer; and forming an n-type ohmic contact metal on the n-type resistive contact layer and a p-type ohmic contact metal on the p.sup.+ -GaAs layer. By this method, because a quantum well formed near to a quantum wire therein is simultaneously removed during removal of other epitaxial layers, another etching process is not required for removing only the quantum well.

REFERENCES:
patent: 4099305 (1978-07-01), Cho et al.
patent: 4614564 (1986-09-01), Sheldon et al.
patent: 5188977 (1993-02-01), Stengl et al.
patent: 5275968 (1994-01-01), Takahashi et al.
Greus, et al: "InGaAs/GaAs Quantum Wires Defined By Lateral Top Barrier Modulation": pub. Sep. 7, 1992, pp. 1199-1201; Appl. Pys. Lett. 61(10), American Inst. of Physics.
Hu, et al: "Large Negative Differential Resistance In A Quasi-One-Dimensional Quantum Wire"; Sep. 7, 1994, pp. 1208-1210; Appln. Phys. Lett. vol. 61, No. 10; American Inst. of Physics.
Mahalingam, et al: "Arsenic Precipitates In Al.sub.0.3 Ga.sub.0.7 As/GaAs Multiple Superlattice And Quantum Well Structures"; Jun. 29, 1992, pp. 3253-3255; Appl. Phys. Lett. 60(26); American Inst. of Physics.
Grambow, et al: "Quantum Wires Prepared By Liquid-Phase-Epitaxial Over-Growth . . . ": pub. Jun. 15, 1992, pp. 2998-3000; Appl. Pys. Lett. 60(24), American Inst. of Physics.
Fasol: "Absence of low temperature saturation of electron-electron scattering in a single . . . ": Aug. 17, 1994, pp. 831-833; Appln. Phys. Lett. vol. 61, No. 7; American Inst. of Physics.

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