Method for fabricating polycrystalline silicon having micro roug

Details Method for fabricating polycrystalline silicon having micro roug Method for fabricating polycrystalline silicon having micro roug

1995-05-23

1997-11-25

Niebling, John

Fishing, trapping, and vermin destroying

437919, 437 60, 437977, H01L 21205

Patent

active

056912498

ABSTRACT:
A method for fabricating a polycrystalline silicon having a roughed surface, which is useful for a capacitor electrode is disclosed. The method is featured by depositing a polycrystalline silicon layer in such a manner that grains of silicon are caused at the surface of the polycrystalline silicon layer. The polycrystalline silicon layer thus obtained has a large effective surface area and is suitable for a capacitor electrode because of its increased effective surface area.

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