Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-09-13
1998-06-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, G03F 900
Patent
active
057668051
ABSTRACT:
Methods of fabricating phase shift masks, which facilitate easy adjustment of the light transmissivity of a field region and the thickness of a phase shift mask, to thereby simplify the production process, and increase its reliability and performance. Embodiments may include the steps of providing a transparent substrate, forming a conductive light shielding layer on the transparent substrate, implanting oxygen ions into the conductive light shielding layer to form a semitransparent film, and selectively etching the semitransparent film to form a phase shift film.
REFERENCES:
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patent: 5322749 (1994-06-01), Han
patent: 5514499 (1996-05-01), Iwamatsu et al.
patent: 5604060 (1997-02-01), Miyashita et al.
Loong, et al.; "Simulation and fabrication of a new phase shifting mask for 0.35 .mu.m contact hole pattern transfer: Halftone-rim"; SPIE vol. 2087 Photomask Technology and Management (1993); pp. 380-389.
Iwabuchi, et al.; "Monolayer Halftone Phase-Shifting Mask for KrF Excimer Laser Lithography"; Jpn. J. Appl. Phys. vol. 32 (1993); pp. 5900-5902.
Lin; "The Attenuated Phase-Shifting Mask"; Solid State Technology; Jan., 1992; pp. 43-47.
Han Oh Seok
Lee Jun Seok
LG Semicon Co. Ltd.
Rosasco S.
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