Method for fabricating periodically multilayered film

Details Method for fabricating periodically multilayered film Method for fabricating periodically multilayered film

1986-07-31

1988-01-12

Silverberg, Sam

Fishing, trapping, and vermin destroying

427 86, 427 75, 427 74, 427 87, 427 85, 427 88, 427 89, 427 91, 427 93, 427 531, 437173, 437235, B05D 306

Patent

active

047191236

ABSTRACT:
A method for fabricating a periodically multilayered film having a plurality of amorphous thin layers of different kinds stacked periodically is performed by forming at least one kind of the layers in the stack by a photo CVD method, whereby a more definite periodicity in the composition of the lattice and fewer defects are achieved.

REFERENCES:
patent: 4237151 (1980-12-01), Strongin
patent: 4435445 (1984-03-01), Allred
patent: 4461783 (1984-07-01), Yamazaki
patent: 4492605 (1985-01-01), Ishihara
patent: 4505950 (1985-03-01), Yamazaki
patent: 4564533 (1986-01-01), Yamazaki
patent: 4588610 (1986-05-01), Yamazaki
B. A. Scott et al., "Deposition of a-Si:H by Homogeneous CVD" Journal De Physique Colloque C4, Supplement au N.degree.10, Tome 42, Oct. 1981, C4-635 to C4-638.
Murase, K. et al. "Silicon-Germanium-Boron Ternary Amorphous Alloy" Japanese Journal of Applied Physics, vol. 21, No. 4, Apr., 1982, pp. 561-566.
Extended Abstracts of the 30th Spring Meeting of the Japan Society of Applied Physics and Related Societies, 6P-B-17, 1983, p. 377.

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