Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2008-05-27
2008-05-27
Alanko, Anita K (Department: 1792)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S041000, C216S044000, C216S049000, C216S057000, C216S067000, C216S083000, C216S100000
Reexamination Certificate
active
07378028
ABSTRACT:
A method of fabricating a patterned magnetic layer comprises sequential steps of:(a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of the substrate, and a layer of a non-magnetic material overlying the layer of magnetic material;(b) forming a layer of a mask material on the layer of non-magnetic material;(c) forming a topographical pattern comprising a plurality of recesses in the layer of mask material;(d) selectively removing portions of the layer of non-magnetic material proximate lower portions of the recesses, thereby exposing selected portions of the layer of magnetic material;(e) treating the exposed portions of the layer of magnetic material with a liquid for reducing the magnetic properties thereof; and(f) removing the topographically patterned layer of mask material.
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Deeman Neil
Gauzner Gennady
Kurataka Nobuo
Wago Koichi
Wang Hong-Ying
Alanko Anita K
McDermott Will & Emery LLP
Seagate Technology LLC
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