Method for fabricating needles via conformal deposition in two-p

Details Method for fabricating needles via conformal deposition in two-p Method for fabricating needles via conformal deposition in two-p

1998-03-18

2000-08-22

Fiorilla, Christopher A.

Plastic and nonmetallic article shaping or treating: processes

Gas or vapor deposition of article forming material onto...

B22D 2300

Patent

active

061067512

ABSTRACT:
A method of fabricating a needle via conformal deposition in a two-piece mold includes the step of attaching a top mold member to a bottom mold member such that the top mold member and the bottom mold member define an enclosed, elongated needle trench with a deposition aperture. A conformal substance, such as polysilicon, is then passed through the deposition aperture such that the conformal substance is deposited within the enclosed, elongated needle trench to form a needle. The method is used to form needles with prongs, multiple channels, multiple ports, barbs, strength enhancement features, and circuitry.

REFERENCES:
patent: 5383512 (1995-01-01), Jarvis
Chen et al., "A Multichannel Neural Probe for Selective Chemical Delivery at the Cellular Level", Solid State Sensor and Actuator Workshop Hilton Head, SC Jun. 13-16, 1994.
Keller et al., "Milli-Scale Polysilicon Structures", Solid-State Sensor and Actuator Workshop Hilton Head, SC Jun. 13-16, 1994 note that p. 133 not reviewed, not present.
Keller et al., "Nickel-Filled Hexsil Thermally Actuated Tweezers", Technical Digest, Transducers 95, Stockholm, Sweden, Jun. 25-29, 1995, pp. 376-379.

Affiliated with

Also associated with

Rating

Method for fabricating needles via conformal deposition in two-p does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating needles via conformal deposition in two-p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating needles via conformal deposition in two-p will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-576926