Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1978-04-13
1979-03-06
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, C23C 1500
Patent
active
041429583
ABSTRACT:
A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films. Prior to beginning the deposition of optical films, the ceramic substrate comprising the mirror base is bombarded by the ion beam at an oblique angle to remove surface anomalies and clean it.
REFERENCES:
patent: 3247392 (1966-04-01), Thelen
patent: 3895602 (1975-07-01), Bobenrieth
patent: 4033843 (1977-07-01), Krikorian et al.
patent: 4093349 (1978-06-01), Mills
W. D. Westwood et al "Fabrication of Optical Waveguides by Ion-Beam Sputtering", J. Vac. Sci. Technol., vol. 13, pp. 104-106 (1976).
C. Misiano et al, "Co-Sputtered Optical Films", Vacuum, vol. 27, pp. 403-406 (1977).
Louderback Anthony W.
Wei David T.
Brown Ernest L.
Gillmann Harold E.
Litton Systems Inc.
Porter Warren C.
Weisstuch Aaron
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