Fishing – trapping – and vermin destroying
Patent
1993-11-30
1995-02-14
Hearn, Brian E.
Fishing, trapping, and vermin destroying
437 60, 437126, 437133, 148DIG72, H01L 21265
Patent
active
053895541
ABSTRACT:
In one form of the invention, an emitter structure for a bipolar transistor is disclosed. The structure is comprised of an emitter layer 6 of Al.sub.x Ga.sub.1-x As, where x>0.4, abutting a base layer 8.
REFERENCES:
patent: 4728616 (1988-03-01), Ankri et al.
patent: 4751195 (1988-06-01), Kawai
patent: 4996166 (1991-02-01), Ohshima
W. Liu, W. Lour, and D. Guo, "New AlGaAs/GaAs Double Heterostructure-Emitter Bipolar Transistor Prepared by Molecular Beam Epitaxy", Appl. Phys. Lett., vol. 60 No 3, 20 Jan. 1992, pp. 362-364.
P. Launay, B. Bamueni, A. Duchenois, P. Blanconnier, "Self-Aligned AlGaAs/GaAs HBT's with Tungsten N and P type Ohmic Contacts", Microelectronic Engineering, vol. 15, No. 1/4, Oct. 1991, pp. 161-164.
A. Lahav and M. Genut, "Study of Tungsten and WSi Refractory Ohmic Contacts to Graded-Gap InGaAs/GaAs/AlGaAs Heterostructures", Materials Science and Engineering, vol. B7, No. 3, Dec. 1990, pp. 231-235.
Guan-bo Gao, et al., "emitter Ballasting Resistor Design for, and Current Handling Capability of AlGaAs/GaAs Power Heterojunction Bipolar Transistors", IEEE Transactions on Electron Devices, vol. 38, No. 2, pp. 185-196, Feb. 1991.
Richard H. Winkler, "Thermal Properties of High-Power Transistors", IEEE Transactions on Electron Devices, vol. ED-14, No. 5, pp. 260-263, May 1967.
Robert P. Arnold, et al., "A Quantitative Study of Emitter Ballasting", IEEE Transactions on Electron Devices, vol. ED-21, No. 7, pp. 385-391, Jul. 1974.
S. M. Sze, Physics of Semiconductor Devices, second edition, pp. 169-175.
"500mA AlGaAs/GaAs Power Heterojunction Bipolar Transistor", Electronics Letters, vol. 25, No. 21, pp. 1447-1448, Oct. 12, 1989.
Hill Darrell G.
Liu William U. C.
Donaldson Richard L.
Hearn Brian E.
Kesterson James C.
Nguyen Tuan
Skrehot Michael K.
LandOfFree
Method for fabricating microwave heterojunction bipolar transist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for fabricating microwave heterojunction bipolar transist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating microwave heterojunction bipolar transist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-287456