Method for fabricating micro-structures with various surface...

Details Method for fabricating micro-structures with various surface... Method for fabricating micro-structures with various surface...

2006-08-08

2006-08-08

Olsen, Allan (Department: 1763)

Etching a substrate: processes

Forming groove or hole in a substrate which is subsequently...

C216S065000, C216S067000

Reexamination Certificate

active

07087181

ABSTRACT:
The technology is based on the anisotropic plasma etching of organic polymer sheets partially protected by a metallic mask. The originality of the process is to pattern the surface properties by the same physical means as the one used for the three dimensional fabrication and simultaneously to this fabrication. Surface properties means, but are not limited to hydrophobicity, hydrophilicity, conductivity, reflectability, rugosity and more precisely the chemical and/or physical state of the surface. It is also possible to generate the desired fonctionalities, for instance carboxylic acid, ester, ether, amid or imid, during the etching process. The patterning of the different properties may be achieved by two different techniques that may be used separately or simultaneously.

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patent: 2004/0115833 (2004-06-01), Sudor
patent: WO 92 15408 (1992-09-01), None
International Preliminary Examination Report datedMay 27, 2002.

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