Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – Eroding workpiece of nonuniform internal electrical...
Patent
1997-10-30
1999-10-19
Valentine, Donald R.
Electrolysis: processes, compositions used therein, and methods
Electrolytic erosion of a workpiece for shape or surface...
Eroding workpiece of nonuniform internal electrical...
205666, 216 87, C25F 312
Patent
active
059683368
ABSTRACT:
A method, apparatus and system for fabricating a stencil mask for ion beam and electron beam lithography are provided. The stencil mask includes a silicon substrate, a membrane formed from the substrate, and a mask pattern formed by through openings in the membrane. The method includes defining the mask pattern and membrane area using semiconductor fabrication processes, and then forming the membrane by back side etching the substrate. The apparatus is configured to electrochemically wet etch the substrate, and to equalize pressure on either side of the substrate during the etch process. The system includes an ion implanter for defining a membrane area on the substrate, optical or e-beam pattern generators for patterning various masks on the substrate, a reactive ion etcher for etching the mask pattern in the substrate, and the apparatus for etching the back side of the substrate.
REFERENCES:
patent: 4966663 (1990-10-01), Mauger
patent: 5672449 (1997-09-01), Loschner et al.
Gratton Stephen A.
Micro)n Technology, Inc.
Valentine Donald R.
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