Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2008-07-10
2010-06-29
Nguyen, Ha Tran T (Department: 2829)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257S057000, C257S072000, C257S257000, C257S368000, C257S392000
Reexamination Certificate
active
07745242
ABSTRACT:
A method for fabricating a liquid crystal display device is disclosed. The method includes forming a first conductive layer on an insulating substrate, forming a first insulating layer, a second conductive layer, and a third conductive layer on the first conductive layer, patterning the second conductive layer and the third conductive layer, such that the third conductive layer is located on a partial region of the second conductive layer, forming a second insulating layer on the patterned third conductive layer, forming a first contact hole to expose the first conductive layer by patterning the first and second insulating layers, and a second contact hole to expose the third conductive layer by patterning the second insulating layer, and forming a fourth conductive layer to connect the first and third conductive layers with each other by way of the first and second contact holes.
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Hwang Tae Ung
Moon Kyo Ho
Birch & Stewart Kolasch & Birch, LLP
LG Display Co. Ltd.
Nguyen Ha Tran T
Pathak Shantanu C
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