Method for fabricating grating coupler

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117101, 117108, 117953, C30B 2516

Patent

active

058556699

ABSTRACT:
A grating coupler is formed by growing an optical waveguide layer on a substrate by an epitaxial growing process such as a metalorganic chemical vapor deposition and a molecular beam deposition. The optical waveguide layer has a surface on which a cross-hatch pattern serving as the grating is continuously formed. The optical waveguide layer is formed with a material having a reflective index greater than a reflective index of the substrate or an atmosphere. Specifically, the substrate is formed with GaAs and the optical waveguide layer is formed with InGaAs. Further, the plane, so as to form the optical waveguide layer having continuous cross-hatch patterns on the surface thereof. The spacing between the cross-hatch patterns can be varied according to variation of a growth temperature of the optical waveguide layer.

REFERENCES:
patent: 4624000 (1986-11-01), Streifer et al.
patent: 5488504 (1996-01-01), Worchesky et al.
patent: 5528707 (1996-06-01), Sullivan et al.
Wang et al, "Critical Layer Thickness of Strained-Layer InGaAs/GaAs Multiple Quantum Wells . . . " Journal of Electronic Materials, vol. 22, No. 11 1993 pp. 1365-1368.
Hake et al, "Initial Results for In GaAs Films Grown as InGaAs Substrates", Journal Vacuum Science and Technology B vol. 13(2) Mar./Apr. 1995 pp. 678-680.
Kui et al "Thermal Relaxation in Strained InGaAs/GaAs Heterostructure," Journal of Electronic Materials, vol. 20, No. 10 1991 pp. 827-831.
Kapon, E., et al. Photoresist gratings on reflecting surfaces, J. Appl. Phys., vol. 53, No. 3, pp. 1387-1390, Mar., 1982.
Chang, K.H., et al. Crosshatched surface morphology in strained III-V semiconductor films, J. Appl. Phys., vol. 67, No. 9, pp. 4093-4098, May 1, 1990.
Yoon, M., et al. Evolution of the surface cross-hatch pattern in In.sub.x Ga.sub.x-1 As/GaAs layers grown by metal-organic chemical vapor deposition, Appl. Phys. Lett., vol. 68, No. 1, pp. 16-18, Jan. 1, 1996.
H. G. Hunsperger, Integrated Optics: Theory and Technology, 3rd Edition in Springer series in Optical Sciences, vol. 33, edited by Theodor Tamir, New York, 1991, pp. 100-103.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for fabricating grating coupler does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating grating coupler, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating grating coupler will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-858291

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.