Method for fabricating color solid-state image sensor

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

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438 69, 257294, 257440, 430 4, G03C 184

Patent

active

058540911

ABSTRACT:
A method for fabricating a color solid-state image sensor having a plurality of photoelectric conversion regions includes the steps of respectively forming a magenta color filter layer, a yellow color filter layer, and a cyan color filter layer over three photoelectric conversion regions of the plurality of photoelectric conversion regions; and implanting ions into the magenta and cyan color filter layers, thereby reducing transmittivity of blue composition of light which passes the magenta and cyan color filter layers.

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