Method for fabricating CMOS image sensor

Details Method for fabricating CMOS image sensor Method for fabricating CMOS image sensor

2007-11-13

2007-11-13

Geyer, Scott B. (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C257SE31001

Reexamination Certificate

active

11320482

ABSTRACT:
In a method for fabricating a CMOS image sensor, microlenses are formed with a silicon nitride layer formed on a pad such that it is possible to decrease a height of microlens and to improve a refraction ratio. In addition to main lenses in shape of curved surface, inner lenses are formed in shape of a sidewall spacer by etching oxide and nitride layers at a high etching selection ratio.

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