Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-08-09
2011-08-09
Huff, Mark F (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C438S706000
Reexamination Certificate
active
07993803
ABSTRACT:
A method for fabricating a chromeless phase shift mask having a phase shift mask with a groove shape includes: forming a recess region with a first depth between the phase shift regions of a substrate; forming a plug for a mask that fills the recess region; forming a mask pattern aligned with the mask plug over the mask plug; and forming a groove with a second depth in the substrate by etching using the mask pattern.
REFERENCES:
patent: 5240796 (1993-08-01), Lee et al.
patent: 7005217 (2006-02-01), Bailey et al.
patent: 7767365 (2010-08-01), Carpenter et al.
patent: 2004/0180548 (2004-09-01), Tzu et al.
patent: 2006/0019176 (2006-01-01), Kim et al.
patent: 2006/0166106 (2006-07-01), Chandrachood et al.
patent: 2007/0092839 (2007-04-01), Tan et al.
patent: 10-2000-0018720 (2000-04-01), None
patent: 10-2006-0049495 (2006-05-01), None
patent: 10-2007-0059755 (2007-06-01), None
patent: 10-2008-0001467 (2008-01-01), None
Fraser Stewart A
Huff Mark F
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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