Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-05-15
2007-05-15
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S455000
Reexamination Certificate
active
11395702
ABSTRACT:
A waveguide is fabricated by first preparing two waveguide precursor pieces. Each waveguide precursor piece includes a single-crystal substrate, and an epitaxial coating layer of an oxide coating material on the substrate. The oxide substrate material preferably comprises yttrium as a substrate-material cation, and the oxide coating material preferably comprises a coating-material cation selected from the group consisting of ytterbium, thulium, erbium, and holmium. The two substrates are placed together with the coating layers in contact to form a precursor structure. The precursor structure is heated to an elevated diffusion temperature so that the coating layers bond together and the coating materials and the respective substrate materials interdiffuse to form the waveguide having an interdiffused region. A laser beam may be directed through the interdiffused region, while the interdiffused region is optionally optically pumped through one or both of the substrates.
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Bruesselbach Hans W.
Narayanan Authi A.
Sumida David S.
Alkov Leonard A.
Mulpuri Savitri
Raytheon Company
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