Method for fabricating an indium tin oxide film for a transparen

Details Method for fabricating an indium tin oxide film for a transparen Method for fabricating an indium tin oxide film for a transparen

1982-02-01

1983-08-16

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

043990150

ABSTRACT:
A method for fabricating an indium tin oxide (ITO) film comprises depositing the ITO film on a heat-resisting substrate by sputtering using a metal alloy target of In-Sn in an atmosphere including an active gas, and heat-treating the ITO film at about 550-650 degrees Centigrade in an oxygen-free atmosphere. Preferably, the heat-resisting substrate comprises an aluminoborosilicate glass. Further, sputtering, preferably reactive sputtering, is employed.

REFERENCES:
patent: 3749658 (1973-07-01), Vossen
patent: 4010291 (1977-03-01), Katsube et al.
Fan International Patent Publication No. WO80/00713.
Thornton et al., J. Vac. Sci. Technol. 13 (1976) pp. 117-121.
Hoffman et al., App. Phys. 16 (1978) pp. 381-390.
Motzen, J. Vac. Sci. Technol. 12 (1975) pp. 99-101.

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