Coating processes – Nonuniform coating – Deforming the base or coating or removing a portion of the...
Reexamination Certificate
2007-12-18
2007-12-18
Chen, Bret (Department: 1762)
Coating processes
Nonuniform coating
Deforming the base or coating or removing a portion of the...
C427S272000, C427S282000, C427S249700, C427S249800, C427S534000, C216S037000, C216S066000, C438S707000, C438S759000
Reexamination Certificate
active
10770526
ABSTRACT:
The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are successively formed onto a substrate; wherein the photoresist film is more capable of anticorrosion than the diamond film. Then an energy beam lithography system is provided to make the photoresist film form a photoresist mask with particularly arranged patterns. Because of the etching selectivity between the diamond film and the photoresist film, on the surface of the diamond film a pattern can be easily formed with recessions and protrusions according to the photoresist mask by dry etching method.
REFERENCES:
patent: 5843224 (1998-12-01), Zachai et al.
patent: 6056887 (2000-05-01), Niedermann et al.
patent: 6350389 (2002-02-01), Fujishima et al.
patent: 6671034 (2003-12-01), Hatakeyama et al.
patent: 6767771 (2004-07-01), Kim
patent: 7067207 (2006-06-01), Kamata et al.
patent: 2004/0211755 (2004-10-01), Yusa et al.
patent: 2004/0214447 (2004-10-01), Stasiak et al.
patent: 2005/0084804 (2005-04-01), Truskett et al.
patent: 2005/0126470 (2005-06-01), Herman et al.
patent: 2005/0146793 (2005-07-01), Nellissen
patent: 2005/0271819 (2005-12-01), Wago et al.
Cheng Chih-Yung
Tsai Hung-Yin
Wu Chih-Hung
Chen Bret
Industrial Technology Research Institute
Troxell Law Office PLLC
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