Method for fabricating aligned patterns on the opposed surfaces

Details Method for fabricating aligned patterns on the opposed surfaces Method for fabricating aligned patterns on the opposed surfaces

1981-07-06

1983-02-01

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430311, 430313, 430317, 430318, 430319, 430329, C03C 500

Patent

active

043715982

ABSTRACT:
A method is provided for fabricating substantially vertically aligned patterns of material on the opposed surfaces of a transparent substrate by employing a single external mask.

REFERENCES:
patent: 3240601 (1966-03-01), Stalnecker et al.
patent: 3313626 (1967-04-01), Whitney
patent: 3447924 (1969-06-01), Trzyna et al.
patent: 3760471 (1973-09-01), Borner
patent: 4254210 (1981-03-01), Van Stappen
Yashiro et al., A New Method of Specimen Preparation for FIM and FEM, 1977, Surface Science 67, No. 2, Oct. pp. 605-610.
"Double-Sided Photolithography", by Heinz, Chuss, Schroeder, Solid State Technology, Aug. 1978, pp. 55-60.

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