Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing...
Reexamination Certificate
2006-10-03
2006-10-03
Chowdhury, Tarifur R. (Department: 2871)
Liquid crystal cells, elements and systems
Nominal manufacturing methods or post manufacturing...
C349S114000
Reexamination Certificate
active
07116392
ABSTRACT:
A fabricating method of an array substrate for a transflective liquid crystal display device includes: sequentially depositing a first metal layer and an impurity-doped amorphous silicon layer on a substrate and etching the first metal layer and the impurity-doped amorphous silicon layer through a first mask process to form source and drain electrodes, a data line and an ohmic contact layer. An amorphous silicon layer, a first insulating layer and a second metal layer are sequentially deposited on the source and drain electrodes, the data line and the ohmic contact layer and etching the amorphous silicon layer, the first insulating layer and the second metal layer through a second mask process to form a gate electrode, a gate line and an active layer, the gate line defining a pixel region with the data line. A second insulating layer is formed on the gate electrode and the gate line. A reflective plate is formed on the second insulating layer at the pixel region through a third mask process, the reflective plate having a transmissive hole. A third insulating layer is deposited on the reflective plate and etching the third insulating layer through a fourth mask process to form a drain contact hole exposing the drain electrode and a transmissive groove corresponding to the transmissive hole. A pixel electrode is formed on the third insulating layer through a fifth mask process, the pixel electrode being connected to the drain electrode through the drain contact hole.
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Yamaguichi et al., “A Simple Reflective TFT-LCD Fabrication Using Four Photomask Processes”, SID 98 DIGEST 20.2, p. 297.###.
Chowdhury Tarifur R.
LG. Philips LCD Co. Ltd.
McKenna Long & Aldridge LLP
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