Method for fabricating a thin film magnetic head

Details Method for fabricating a thin film magnetic head Method for fabricating a thin film magnetic head

2005-08-30

2005-08-30

Tugbang, Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603070, C029S603080, C029S603120, C029S603150, C029S603160, C204S192150, C216S039000, C216S041000, C360S122000, C360S125330, C360S317000, C427S127000, C427S128000, C430S312000, C430S316000

Reexamination Certificate

active

06935014

ABSTRACT:
An electrode film and a protective electrode film are formed on an insulating film and a first magnetic film in turn. Then, a first photoresist layer, an intermediate layer and a second photoresist layer are formed on the protective electrode film in turn. The intermediate layer is formed by a sputtering method so that the surface temperature of the intermediate layer is set to 140° C. or below. Then, the first photoresist layer is exposed and developed, to fabricate a photoresist pattern. Then, the intermediate layer is partially etched and removed via the photoresist pattern as a mask by a reactive ion etching method using a chlorine-based gas.

REFERENCES:
patent: 5438747 (1995-08-01), Krounbi et al.
patent: 5665251 (1997-09-01), Robertson et al.
patent: 6156487 (2000-12-01), Jennison et al.
patent: 6329211 (2001-12-01), Terunuma et al.
patent: 6539610 (2003-04-01), Lo et al.
patent: 11161915 (1999-06-01), None
patent: 2000-132812 (2000-05-01), None
“Thin-film inductive heads for perpendicular recording”; Schewe, H.; Stephani, D.; Magnetics, IEEE Transactions on, vol.: 26 , Issue: 6 , Nov. 1990; pp.: 2966-2971.

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