Method for fabricating a thin film capacitor

Details Method for fabricating a thin film capacitor Method for fabricating a thin film capacitor

1994-04-12

1994-11-22

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437 60, 437919, 257295, 365145, H01L 2170, H01L 2700

Patent

active

053669207

ABSTRACT:
A thin film capacitor which comprises a lower electrode, a dielectric film and an upper electrode is fabricated on a substrate. The lower electrode is not provided by etching process using a photoresist mask, but it is provided by providing an aperture thorough an insulating layer deposited on the substrate, and depositing a conductive film on the bottom of the aperture and connected to a lower interconnection provided on the bottom of the aperture. Consequently, no convex protrusion is found at the processed edge of the lower electrode.

REFERENCES:
patent: 5081559 (1992-01-01), Fazan et al.
patent: 5192704 (1993-03-01), McDavid et al.
patent: 5227855 (1993-07-01), Momose
By T. Ema et al., "3-Dimensional Stacked Capacitor Cell for 16M and 64M Drams", IEEE, International Electron Devices Meeting Digest of Technical Papers, 1988, pp. 592-595.

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