Chemistry: electrical and wave energy – Processes and products
Patent
1974-02-08
1976-07-13
Tufariello, T. M.
Chemistry: electrical and wave energy
Processes and products
29 2542, 204192, 317258, C25D 502, C25D 512
Patent
active
039691977
ABSTRACT:
A process has been developed for fabricating a nonpolar low loss thin film capacitor utilizing tantalum oxide for high capacitance per unit area as a dielectric which is deposited in film form relative to a suitable substrate. A counter electrode is deposited on a substrate. A film of metal having a high recrystallization temperature is deposited on the counter electrode. This deposition forms the bottom electrode of the capacitor structure. The metal film has a quality thermal expansion resistance and a high reliability in thermal environments.
REFERENCES:
patent: 3179862 (1965-04-01), Dubilier
patent: 3257305 (1966-06-01), Varga
patent: 3350222 (1967-10-01), Ames et al.
patent: 3568014 (1971-03-01), Schuermeyer
patent: 3607679 (1971-09-01), Melroy
patent: 3869367 (1975-03-01), Sato
Fuller Clyde Rhea
Ghate Prabhakar Bhimrao
Hooper Robert Curlee
Tolar Neal Jay
Comfort James T.
Honeycutt Gary C.
Levine Harold
Texas Instruments Incorporated
Tufariello T. M.
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