Method for fabricating a solid-state imaging device using photoc

Coating processes – Electrical product produced – Photoelectric

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204192P, B05D 132, H01L 3118

Patent

active

043649734

ABSTRACT:
A method for fabricating a solid-state imaging device using photoconductive film, comprising the step of depositing a photoconductive material onto a scanner IC by the use of a shield plate, the scanner IC including vertical switching MOS transistors and horizontal switching MOS transistors arrayed in the form of a matrix and vertical and horizontal scanning shift registers for scanning the vertical and horizontal switching MOS transistors respectively, the shield plate having an open part corresponding to a vertical switching MOS transistor array area.

REFERENCES:
patent: 4181755 (1980-01-01), Liv et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for fabricating a solid-state imaging device using photoc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating a solid-state imaging device using photoc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a solid-state imaging device using photoc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-406219

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.