Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2006-09-29
2010-02-09
Ghyka, Alexander G (Department: 2812)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C438S396000, C257SE21008
Reexamination Certificate
active
07658773
ABSTRACT:
A method for fabricating a solid electrolyte memory device comprises a plurality of solid electrolyte memory cells, the solid electrolyte memory cells sharing a common continuous solid electrolyte layer comprising solid electrolyte cell areas and solid electrolyte inter-cell areas, the method comprising the process of introducing mobile ion solubility reducing material or mobile ion mobility reducing material into the solid electrolyte inter-cell areas.
REFERENCES:
patent: 5494762 (1996-02-01), Isoyama et al.
patent: 6306509 (2001-10-01), Takeuchi et al.
patent: 7455700 (2008-11-01), Meinhardt et al.
patent: 2004/0009404 (2004-01-01), Harrup et al.
patent: 2004/0157417 (2004-08-01), Moore et al.
patent: 2005/0167787 (2005-08-01), Fricke et al.
patent: 2006/0175640 (2006-08-01), Happ et al.
patent: 10 2005 001 253 (2006-07-01), None
Kozicki, M.N., et al., “Can Solid State Electrochemistry Eliminate the Memory Scaling Quandary?,” IEEE Silicon Nanoelectronics Workshop, 2002, 15 pages.
Symanczyk, R., et al., “Electrical Characterization of Solid State Ionic Memory Elelments,” NVMTS, 2003, 6 pages.
Kund, M., et al., “Conductive bridging RAM (CBRAM): An emerging non-volatile memory technology scalable to sub 20nm,” IEEE, 2005, Session 31.5, 4 pages.
Altis Semiconductor SNC
Ghyka Alexander G
Nikmanesh Seahvosh J
Qimonda AG
Slater & Matsil L.L.P.
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