Metal working – Method of mechanical manufacture – Obtaining plural product pieces from unitary workpiece
Patent
1977-11-03
1979-02-20
Lanham, C. W.
Metal working
Method of mechanical manufacture
Obtaining plural product pieces from unitary workpiece
29592R, 33 1R, 204 37R, 204 40, H01J 900, H01J 3726, B23P 1700
Patent
active
041399331
ABSTRACT:
A microscopic length scale typically about 50 .mu.m long and graduated in several intervals ranging from 1 .mu.m to 20 .mu.m. The scale is useful in calibrating the magnification of scanning electron microscopes (SEMs) and other electron imaging instruments. The scale comprises alternating layers of two metals deposited on a substrate. The two metals have substantially different electron emission coefficients to provide contrasting emission signals when scanned by an electron beam. One of the metals, preferably gold, is deposited in uniform layers about 40-80 nm thick. The other metal, preferably nickel, is deposited in several layers ranging from 1 .mu.m or so thick near the substrate to 20 .mu.m thick in the outermost layer. The resultant multilayer composite is cut into one or more samples and each sample is mounted on edge. The exposed edge is ground and metallographically polished and a microscopic indentation is made in the substrate near the first gold layer. The indentation defines a reference region, and the distances between the first gold layer and the subsequent gold layers in the reference region are measured. The measurement is made using a similar sample which was previously calibrated with the aid of a polarizing layer interferometer.
REFERENCES:
patent: 2116927 (1938-05-01), Germer
patent: 2859158 (1958-11-01), Schaer
patent: 3659098 (1972-04-01), Politycki et al.
patent: 3954420 (1976-05-01), Hyner et al.
patent: 3987529 (1976-10-01), Nakagawa et al.
patent: 4005527 (1977-02-01), Wilson et al.
IBM Resolution Indicator for Scanning Electron Microscopes, Thomas J. Wat Research Center, Yorktown Heights, N.Y., Aug., 1972.
National Bureau of Standards Special Publication 400-17, "Semiconductor Measurement Technology Progress Report," Oct. 1-Dec. 31, 1974, (Nov. 1975), pp. 36, 37.
Metal Research Institute TNO, J. W. Schinkel, Dept. for Applied Chemistry, Netherland.
Ballard David B.
Ogburn Fielding
Young John P.
Crane Daniel C.
Englert Alvin J.
Lanham C. W.
Pawlikowski Eugene J.
The United States of America as represented by the Secretary of
LandOfFree
Method for fabricating a scanning electron microscope micrometer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for fabricating a scanning electron microscope micrometer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a scanning electron microscope micrometer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-251942