Method for fabricating a reflective type reflector plate of...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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C349S138000, C349S187000

Reexamination Certificate

active

06999141

ABSTRACT:
The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

REFERENCES:
patent: 6559917 (2003-05-01), Ikeno
patent: 6822708 (2004-11-01), Fujino
patent: 2003/0058388 (2003-03-01), Nakayoshi et al.
patent: 2004/0189896 (2004-09-01), Cho et al.
patent: 2005/0012878 (2005-01-01), Sakamto et al.
patent: 2005/0018112 (2005-01-01), Jang et al.
DERWENT-ACC-2003-326367 (KR2002095543A), “Fabricating method of tft substrate for reflective LCD”, J. H. Lee, Dec. 27, 2002.

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