Method for fabricating a phase shift mask

Details Method for fabricating a phase shift mask Method for fabricating a phase shift mask

1995-03-09

1996-10-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430323, 430324, 216 12, G03F 900

Patent

active

055675522

ABSTRACT:
A method for fabricating a phase shift mask is disclosed. In order to make the phase shift mask, an etching groove is formed on the light shielding portion of the quartz substrate and chrome is then formed on the center portion of the etching groove. The phase shift mask produces a phase shift effect without using phase shift materials, thereby increasing the optical contrast.

REFERENCES:
patent: 5358827 (1994-10-01), Garofalo et al.
patent: 5405721 (1995-04-01), Pierrat
patent: 5411824 (1994-06-01), Vasudev et al.

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