Method for fabricating a nitride semiconductor...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Packaging or treatment of packaged semiconductor

Reexamination Certificate

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C438S033000, C438S044000

Reexamination Certificate

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07109049

ABSTRACT:
Provided is a method for fabricating a nitride semiconductor light-emitting device including a nitride semiconductor substrate having a groove and a ridge formed on the top surface thereof so as to extend in the shape of stripes and a nitride semiconductor growth layer consisting of a plurality of nitride semiconductor layers laid on top of the nitride semiconductor substrate. The method involves a step of forming a 10 μm or more wide flat region above at least either of the groove and ridge by forming the nitride semiconductor growth layer on top of the nitride semiconductor substrate so that the height of the nitride semiconductor growth layer laid above the groove is smaller than the height of the nitride semiconductor growth layer laid above the ridge.

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Zauner et al “Homo-epitaxial growth on misorineted GaN substrates by MOCVD”, Mat.Res.Soc.Symp.vol. 595 2000 Material rearcg sosciety, ppW6.3.1-W6.3.5).

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