Method for fabricating a monolithic chip including pH,...

Details Method for fabricating a monolithic chip including pH,... Method for fabricating a monolithic chip including pH,...

2005-05-24

2005-05-24

Smith, Matthew (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C438S199000

Reexamination Certificate

active

06897081

ABSTRACT:
A method for fabricating a monolithic chip including multi-sensors that can detect pH, temperature, photo-intensity simultaneously and a readout circuit. As such, as well as the multi-sensors, the readout circuit also has a reduced chip area at low cost since selection switches are used to sequentially read pH, temperature and photo-intensity detecting values, wherein the readout action is completed within a clock cycle. The entire structure is fabricated with standard 0.5 μm CMOS IC, Double Poly Double Metal (DPDM), n-well technology and allows the integration of the on-chip signal conditioning circuitry. The chip fabricated by the method can not only sense the Ph, temperature, photo values but also apply the extended gate field effect transistor (EGFET) on the temperature and light compensation to produce realistic pH values.

REFERENCES:
patent: 5607566 (1997-03-01), Brown et al.
patent: 6329139 (2001-12-01), Nova et al.
patent: 6531752 (2003-03-01), Yaung et al.
patent: 20020130069 (2002-09-01), Moskoff
patent: 20030047752 (2003-03-01), Campbell et al.

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