Method for fabricating a microelectronic circuit including...

Details Method for fabricating a microelectronic circuit including... Method for fabricating a microelectronic circuit including...

2006-02-28

2006-02-28

Brewster, William M. (Department: 2823)

Semiconductor device manufacturing: process

Making passive device

C438S627000, C438S637000, C438S643000

Reexamination Certificate

active

07005360

ABSTRACT:
A method for fabricating a microelectronic circuit having an improved electrically conductive element. The method includes providing a finished processed microelectronic circuit having a monolithically integrated coil and having a passivation layer situated above at least the monolithically integrated coil. The method further comprises removing at least part of the passivation layer above the monolithically integrated coil and applying a metal layer above the monolithically integrated coil so that the metal layer is electrically coupled to the monolithically integrated coil.

REFERENCES:
patent: 4613843 (1986-09-01), Esper et al.
patent: 5446311 (1995-08-01), Ewen et al.
patent: 5652173 (1997-07-01), Kim
patent: 5763108 (1998-06-01), Chang et al.
patent: 5793272 (1998-08-01), Burghartz et al.
patent: 6395637 (2002-05-01), Park et al.
patent: 6490128 (2002-12-01), Sato
patent: 197 21 310 (1997-11-01), None
patent: 197 37 294 (1998-04-01), None
patent: 0 551 735 (1999-07-01), None
patent: WO 95/05678 (1995-02-01), None

Affiliated with

Also associated with

Rating

Method for fabricating a microelectronic circuit including... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating a microelectronic circuit including..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a microelectronic circuit including... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3698877