Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-07-11
2006-07-11
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07074527
ABSTRACT:
A bilayer hardmask26is used to manufacture a mask10, which is can be implemented to pattern a resist165on a semiconductor wafer150. In one embodiment, the bilayer hardmask26has two layers: a first hardmask layer28and a second hardmask layer30. The first hardmask layer28may be carbon and can be etched selective to the overlying second hardmask layer30and an underlying absorber structure20. In one embodiment, the second hardmask layer30is a transparent layer of SiON, SiN, or SiO2. The bilayer hardmask26allows for a thinner resist to be used during fabrication of the mask10.
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Lu Bing
Wasson James R.
Freescale Semiconductor Inc.
Rosasco S.
Vo Kim-Marie
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