Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2006-11-21
2006-11-21
Kim, Paul D. (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603070, C029S603120, C029S603130, C029S603150, C029S417000, C360S235700, C360S235800, C360S236300, C360S236500, C360S236700, C427S127000, C427S128000, C451S005000, C451S041000
Reexamination Certificate
active
07137190
ABSTRACT:
A process is described for fabricating magnetic transducers with metallic thin films with a corrosion resistant surface produced by exposing the thin films to a nitrogen in a plasma chamber. The exposure to the nitrogen is believed to increase the corrosion resistance of the metallic thin films by causing nitrides to form in a thin surface region. In the preferred embodiment the thin film metals of a magnetic transducer are treated with the nitrogen after being cut from the wafer and lapped. Typical metals used in magnetic transducers are NiMn, FeMn, NiFe, cobalt, CoFe, copper, IrMn and PtMn. The films may be further protected by the addition of prior art protective layers such as carbon.
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“Characteristics of silicon nitride after O2 plasma surface treatment for pH-ISFET applications”; Li-Te Yin; Jung-Chuan Chou; Wen-Yaw Chung; Tai-Ping Sun; Shen-Ken Hsiung;Biomedical Engineering; Mar. 2001; pp. 340-344.
Hsiao Yiping
Hwang Cherngye
Tabib Jila
Hitachi Global Storage Technologies - Netherlands B.V.
Kim Paul D.
Knight G. Marlin
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