Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2008-03-11
2008-03-11
Kim, Paul D. (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603130, C029S603150, C029S603180, C360S121000, C360S122000, C360S125330, C360S317000, C427S127000, C427S128000, C451S005000, C451S041000
Reexamination Certificate
active
07340824
ABSTRACT:
A first magnetic shield layer of the read head sensor is deposited upon a slider substrate surface. A patterned photoresist is then photolithographically fabricated upon the first magnetic shield layer with openings that are formed alongside the location at which the read sensor will be fabricated. An ion milling step is performed to create pockets within the surface of the magnetic shield layer at the location of the openings in the photoresist layer. The photoresist layer is then removed, and a fill layer is deposited across the surface of the magnetic shield layer in a depth greater than the depth of the pocket. Thereafter, a polishing step is conducted to remove portions of the fill layer down to the surface of the magnetic shield layer. A G1insulation layer is deposited and a magnetic head sensor element is then fabricated upon the insulation layer.
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NIST ATP Epion company overview.
Feldbaum Michael
Kim John I.
Ramasubramanian Murali
Zolla Howard Gordon
Guillot Robert O.
Hitachi Global Storage Technologies - Netherlands B.V.
Intellectual Property Law Offices
Kim Paul D.
LandOfFree
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