Method for fabricating a liquid crystal display

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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Reexamination Certificate

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06933162

ABSTRACT:
A method of fabricating a liquid crystal display (LCD). The gate electrodes or the source/drain electrode pairs of thin film transistors in the LCD are patterned by at least a first mask and a second mask. The gate electrodes or the source/drain electrode pairs at the boundary region defined by both the first and second masks are divided into a first portion patterned by the first mask and a second portion patterned by the second mask. The boundary region is divided incrementally or by square wave such that the area of each of the gate electrodes or the source/drain electrode pairs in the first portion increases along the boundary direction and in the second portion decreases along the boundary direction.

REFERENCES:
patent: 5656526 (1997-08-01), Inada et al.
patent: 5795686 (1998-08-01), Takizawa et al.
patent: 5945256 (1999-08-01), Kim et al.
patent: 6157433 (2000-12-01), Kashimoto et al.
patent: 6773996 (2004-08-01), Suzawa et al.

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