Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2005-08-23
2005-08-23
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
Reexamination Certificate
active
06933162
ABSTRACT:
A method of fabricating a liquid crystal display (LCD). The gate electrodes or the source/drain electrode pairs of thin film transistors in the LCD are patterned by at least a first mask and a second mask. The gate electrodes or the source/drain electrode pairs at the boundary region defined by both the first and second masks are divided into a first portion patterned by the first mask and a second portion patterned by the second mask. The boundary region is divided incrementally or by square wave such that the area of each of the gate electrodes or the source/drain electrode pairs in the first portion increases along the boundary direction and in the second portion decreases along the boundary direction.
REFERENCES:
patent: 5656526 (1997-08-01), Inada et al.
patent: 5795686 (1998-08-01), Takizawa et al.
patent: 5945256 (1999-08-01), Kim et al.
patent: 6157433 (2000-12-01), Kashimoto et al.
patent: 6773996 (2004-08-01), Suzawa et al.
AU Optronics Corp.
Geyer Scott B.
Lebentritt Michael
Thomas Kayden Horstemeyer & Risley
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