Hazardous or toxic waste destruction or containment – Processes for making harmful chemical substances harmless,... – By reacting with chemical agents
Reexamination Certificate
2004-07-03
2009-10-20
Johnson, Edward M (Department: 1793)
Hazardous or toxic waste destruction or containment
Processes for making harmful chemical substances harmless,...
By reacting with chemical agents
C588S405000
Reexamination Certificate
active
07605297
ABSTRACT:
The invention relates to a process for the extractive removal of phenols, alcohols, amines, phoshines, hydroxylamines, hydrazines, oximes, imines, water, carboxylic acids, amino acids, hydroxamic acids, sulfinic acids, sulfonic acids, peroxycarboxylic acids, phosphonous acids, phosphinous acids, phosphonic acids, phosphinic acids or phosphoric acids from aprotic solvents by means of ionic liquids of the formula [K]n+[A]n−, where n, [K]+and An−are defined as in the description.
REFERENCES:
patent: 2003/0091489 (2003-05-01), Hommeltoft
patent: 2003/0199723 (2003-10-01), Hommeltoft
patent: 2005/0010076 (2005-01-01), Wasserscheid et al.
patent: 101 55 281 (2003-06-01), None
patent: 1 310 543 (2003-05-01), None
patent: 1 354 863 (2003-10-01), None
patent: WO-01/40150 (2001-06-01), None
patent: WO-02/34863 (2002-05-01), None
Huddleston, J.G. et al., Chemical Communications—Chemcom, Royal Society of Chemistry, GB, 1998, pp. 1765-1766.
Visser et al., Green Chemistry, Feb. 2000, pp. 1-4.
Bekou et al., Oxford University Press, Sep. 2003.
Budich Manuel
Groβmann Georg
Maase Matthias
Szarvas Laszlo
BASF - Aktiengesellschaft
Birch & Stewart Kolasch & Birch, LLP
Johnson Edward M
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