Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate
2004-03-31
2009-10-20
Chen, Bret (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
C427S255393, C427S255394, C134S001100
Reexamination Certificate
active
07604841
ABSTRACT:
A method for extending time between chamber cleaning processes in a process chamber of a processing system. A particle-reducing film is formed on a chamber component in the process chamber to reduce particle formation in the process chamber during substrate processing, at least one substrate is introduced into the process chamber, a manufacturing process is performed in the process chamber, and the at least one substrate is removed from the process chamber. The particle-reducing film may be deposited on a clean chamber component or on a material deposit formed on a chamber component. Alternatively, the particle-reducing film may be formed by chemically modifying at least a portion of a material deposit on a chamber component. The particle-reducing film may be formed after each manufacturing process or at selected intervals after multiple manufacturing processes.
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Taiwan Intellectual Property Office, Rejection Decision received in related Taiwanese Patent Application No. 94110235 dated Jul. 2008, 2 pp.
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Dip Anthony
Gumpher John
Joe Raymond
Chen Bret
Tokyo Electron Limited
Wood Herron & Evans LLP
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