Method for extending equipment uptime in ion implantation

Details Method for extending equipment uptime in ion implantation Method for extending equipment uptime in ion implantation

2011-01-25

2011-01-25

Barr, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Gas or vapor condensation or absorption on work

C134S022180, C134S042000, C134S022100, C134S001100, C134S039000, C438S706000

Reexamination Certificate

active

07875125

ABSTRACT:
The invention features in-situ cleaning process for an ion source and associated extraction electrodes and similar components of the ion-beam producing system, which chemically removes carbon deposits, increasing service lifetime and performance, without the need to disassemble the system. In particular, an aspect of the invention is directed to an activating, catalytic, or reaction promoting species added to the reactive species to effectively convert the non-volatile molecular residue into a volatile species which can be removed by conventional means.

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