Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Patent
1980-09-29
1981-11-17
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
430 22, 430327, 430396, 430494, 430952, 430966, 430967, G03C 504, G03C 506
Patent
active
043012370
ABSTRACT:
An X-ray transparent mask (51) is comprised of a support ring (42) with a planar substrate stabilizer (41) thereon, the stabilizer having a plurality of apertures (43) therethrough, arranged in a "checkerboard" fashion. A thin X-ray transparent mask substrate (52) is placed over the stabilizer. (41), the substrate having X-ray absorptive metallized patterns (53) thereon which are aligned with the apertures (43). The mask (51) is positioned proximate a semiconductor wafer (56) having a photoresist coating (30) thereon. X-rays (14) are directed at the photoresist coating (30) through the apertures (43) to selectively expose the coating. The mask (51) is then indexed one aperture position and the remaining portion of coating (30) is exposed to the X-rays (14).
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Kimlin Edward C.
Kirk D. J.
Western Electric Co. Inc.
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