Method for exposing a substrate and lithographic projection...

Details Method for exposing a substrate and lithographic projection... Method for exposing a substrate and lithographic projection...

2004-09-09

2010-02-02

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S022000, C430S296000, C430S311000, C430S396000, C430S397000

Reexamination Certificate

active

07655368

ABSTRACT:
A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.

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Australian Search Report issued for Application No. SG 200404944-1, dated Aug. 26, 2005.
Luke Ng, Wenzhan Zhou, “Tool to tool Matching In Photolithography—Process Control of CD and Pitch,” Proceedings of SPIE, p. 932-940, ( 2003).
Notice of Reasons for Rejection issued for Japanese Patent Application No. 2004-261770, dated Jun. 9, 2008.
Decision of Dismissal of Amendment issued for Japanese Patent Application No. 2004-261770, dated Jan. 9, 2009.

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