Method for exposing a substrate and lithographic projection...

Details Method for exposing a substrate and lithographic projection... Method for exposing a substrate and lithographic projection...

2009-02-25

2010-06-08

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S022000, C430S311000, C430S396000, C430S397000, C355S055000, C355S063000, C355S072000, C355S077000

Reexamination Certificate

active

07732110

ABSTRACT:
A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.

REFERENCES:
patent: 5333035 (1994-07-01), Shiraishi
patent: 6218077 (2001-04-01), Jin
patent: 2003/0059716 (2003-03-01), Simizu
patent: 2003/0139054 (2003-07-01), Fujimoto
patent: 1 248 154 (2002-10-01), None
patent: 1248154 (2002-10-01), None
patent: 4-204737 (1992-07-01), None
patent: 6-029182 (1994-02-01), None
patent: 11-297602 (1999-10-01), None
patent: 2001-118784 (2001-04-01), None
patent: 2001118784 (2001-04-01), None
patent: 2001-284222 (2001-10-01), None
patent: 2002-329645 (2002-11-01), None
patent: 2003-209048 (2003-07-01), None
patent: 2000-077303 (2009-04-01), None
Luke Ng, Wenzhan Zhou, “Tool to tool Matching in Photolithography—Process Control of CD and Pitch,” Proceedings of SPIE, pp. 932-940, (2003).
Australian Search Report issued on Aug. 26, 2005 in Application No. SG 200404944-1.
English translation of Japanese Official Action issued on Jun. 9, 2008 in Japanese Application No. 2004-261770.
English translation of Japanese Notice of Dismissal of Amendment issued on Jan. 9, 2009 in Japanese Application No. 2004-261770.
Notice of Reasons for Rejection for Japanese Patent Application No. 2008-310758 dated Jul. 22, 2009.

Affiliated with

Also associated with

Rating

Method for exposing a substrate and lithographic projection... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for exposing a substrate and lithographic projection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for exposing a substrate and lithographic projection... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4149955