Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-03-22
2005-03-22
Goudreau, George A. (Department: 1763)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C438S689000, C438S942000, C134S001300
Reexamination Certificate
active
06869737
ABSTRACT:
In a method for exposing a photosensitive resist layer with near-field light, a liquid film layer is provided between the photosensitive resist layer and a photomask. The photomask has a light-shielding film containing an opening portion through which a propagated light emitted from a light source cannot pass. The photosensitive resist layer is exposed with near-field light through the opening portion and the liquid film layer.
REFERENCES:
patent: 6720115 (2004-04-01), Inao et al.
patent: 0 418 427 (1991-03-01), None
patent: 60-158450 (1985-08-01), None
patent: 3-209479 (1991-09-01), None
“A Novel Fabrication Technology For Smooth 3D Inclined Polymer Microstructures With Adjustable Angles”; Hung et. al.; (2003'); Transducers '03, International Conference On Solid State Sensors, Actuators and Microsystems, abstract only.*
J. Goodberlet et al., “Patterning Sub-50 nm Features with Near-Field Embedded-Amplitude Masks”, Applied Physics Letters, vol. 81, No. 7, Aug. 12, 2002, pp. 1315 and 1317.
M.M. Alkaisi et al., “Optical Near Field Nanolithography”, AAPPS Bulletin vol. 11, No. 3, 2001, p. 10-14.
Ookawa Hideki
Suzuki Keiji
Tonotani Junichi
Foley & Lardner LLP
Goudreau George A.
Kabushiki Kaisha Toshiba
LandOfFree
Method for exposing a photosensitive resist layer with... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for exposing a photosensitive resist layer with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for exposing a photosensitive resist layer with... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3451017