Method for executing a reproducible glow discharge

Details Method for executing a reproducible glow discharge Method for executing a reproducible glow discharge

1986-11-28

1989-03-14

Weisstuch, Aaron

Fishing, trapping, and vermin destroying

136260, 156626, 20419233, 427 8, 427 39, 437 8, H01L 3118

Patent

active

048124168

ABSTRACT:
In order to be able to check whether or not a glow procedure is executed properly, i.e. reproducibly, the temporal course of the formation of characteristic stable reaction products is traced mass spectrometrically.

REFERENCES:
patent: 4362936 (1982-12-01), Hofmann et al.
J. E. Daley et al, IBM Tech. Disc. Bull., vol. 20, No. 11B, Apr. 1978, p. 4802.
B. A. Raby, J. Vac. Sci. Technol., vol. 15, Mar./Apr. 1978, pp. 205-208.
B. S. Meyerson, et al, The Preparation of in Situ Doped Hydrogenated Amorphous Silicon by Homogeneous Chemical Vapor Deposition, J. Appl. Phys. 54(3) Mar. 1983, pp. 1461-1465.
C. I. M. Beenakker, et al, Decomposition and Product Formation in CF.sub.4 -O.sub.2 Plasma Etching Silicon in the Afterglow, J. Appl. Phys. 52(1), Jan. 1981, pp. 480-485.

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