Method for exciting a gas dynamic CO.sub.2 laser and apparatus f

Details Method for exciting a gas dynamic CO.sub.2 laser and apparatus f Method for exciting a gas dynamic CO.sub.2 laser and apparatus f

1977-02-17

1978-07-11

Sikes, William L.

Oscillators

Molecular or particle resonant type

H01S 302

Patent

active

041005074

ABSTRACT:
The present method relates to exciting a gas dynamic CO.sub.2 laser, especially at high stagnation temperatures above 2500.degree. K and at a combustion chamber pressure above 50 bar. A liquid fuel and a liquid oxidizer are injected into the combustion chamber at these operating parameters and the produced laser gas is caused to flow through a Laval nozzle into a resonator. The flow cross sectional area of the Laval nozzle adjacent to the resonator is at least 100 times larger than the flow cross sectional area adjacent to the nozzle neck facing the combustion chamber. The flow of the laser gas through this nozzle cools the gas to about 300.degree. K, whereby an inversion state is produced. The laser for performing this type of operation has a combustion chamber connected through the above mentioned nozzle to a resonator which in turn is connected to a diffuser. A tank for liquid fuel and a tank for a liquid oxidizer are connected to the respective injection nozzles of the combustion chamber, whereby the respective conduits preferably extend through cooling jackets of the combustion chamber of the diffuser.

REFERENCES:
patent: 3900802 (1975-08-01), Milling
patent: 3984784 (1976-10-01), Pinsley

Affiliated with

Also associated with

Rating

Method for exciting a gas dynamic CO.sub.2 laser and apparatus f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for exciting a gas dynamic CO.sub.2 laser and apparatus f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for exciting a gas dynamic CO.sub.2 laser and apparatus f will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-265073