Method for examining foreign matters in through holes

Details Method for examining foreign matters in through holes Method for examining foreign matters in through holes

2006-05-09

2006-05-09

Bali, Vikkram (Department: 2623)

Image analysis

Applications

Manufacturing or product inspection

Reexamination Certificate

active

07043072

ABSTRACT:
Provided herein are a method and an apparatus for examining foreign matters in through holes, which can quickly conduct an examination of foreign matter in through holes with low costs and high accuracy. Light passing through a plurality of through holes having a uniform size is simultaneously taken as image data, the number of areas of the imaged masses corresponding to the plurality of the respective through holes is initially counted, and a process to determine presence or absence of foreign matters is conducted by mutually comparing areas of adjacent masses for only a work piece with a counted value of the masses being concurred with a specified value.

REFERENCES:
patent: 3620630 (1971-11-01), Hergenrother
patent: 4893346 (1990-01-01), Bishop
patent: 5384711 (1995-01-01), Kanai et al.
patent: 5583948 (1996-12-01), Shibayama
patent: 6624885 (2003-09-01), Pon et al.
patent: 408229920 (1996-09-01), None
U.S. Appl. No. 09/821,695, filed Mar. 29, 2001, Goto et al.
U.S. Appl. No. 09/821,789, filed Mar. 29, 2001, Goto et al.

Affiliated with

Also associated with

Rating

Method for examining foreign matters in through holes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for examining foreign matters in through holes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for examining foreign matters in through holes will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3549877