Method for evaluating roughness on silicon substrate surface

Details Method for evaluating roughness on silicon substrate surface Method for evaluating roughness on silicon substrate surface

1992-07-07

1993-09-07

Housel, James C.

Chemistry: analytical and immunological testing

Process or composition for determination of physical state...

Surface area, porosity, imperfection, or alteration

436 72, 436124, 436151, 73104, 73105, G01N 3102

Patent

active

052428311

ABSTRACT:
A method for evaluating surface micro roughness of a silicon substrate includes the steps of soaking the silicon substrate in a mixture of hydrochloric acid of 30 to 40 vol %, hydrogen peroxide solution of 30 to 40 vol % and deionized water whose volume ratio is approximately 1:1:16.7, and measuring an amount of chlorine element incorporated into native oxide film on the silicon surface through the soaking process to evaluate the degree of the micro roughness on the silicon substrate surface.

REFERENCES:
patent: 4105508 (1978-08-01), Arod et al.
patent: 4464222 (1984-08-01), Gutsche
patent: 4638552 (1987-01-01), Shimbo et al.
patent: 4746591 (1988-05-01), Sakaki et al.
patent: 4851370 (1989-07-01), Doklan et al.
patent: 5153701 (1992-10-01), Roy

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