Method for evaluating, monitoring or controlling the efficiency,

Details Method for evaluating, monitoring or controlling the efficiency, Method for evaluating, monitoring or controlling the efficiency,

1995-02-03

1998-01-27

Warden, Jill

Chemistry: analytical and immunological testing

Oxygen containing

Ozone or peroxide

436 34, 436129, 436148, G01N 700

Patent

active

057121680

ABSTRACT:
A method for evaluating, monitoring or controlling the efficiency, stability or exhaustion of a complexing or chelating agent present in a chemical solution used for oxidizing, dissolving, etching or stripping a semiconductor wafer wherein:

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Schmidt, et al., "The Importance of H.sub.2 O.sub.2 Decomposition in Silicon Surface Cleaning", 1994 International Conference on Solid State Devices and Materials, Pacifico Yokohama, Yokohama, Japan, Aug. 1994.

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