Optics: measuring and testing – Dimension
Reexamination Certificate
2006-03-10
2010-02-02
Toatley, Jr., Gregory J (Department: 2877)
Optics: measuring and testing
Dimension
C356S237100, C356S239300
Reexamination Certificate
active
07656542
ABSTRACT:
In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
REFERENCES:
patent: 6782337 (2004-08-01), Wack et al.
patent: 6898537 (2005-05-01), McGahan
patent: 2006/0244969 (2006-11-01), Ryan et al.
Forman Darren
Hummel Steven
Littau Mike
Raymond Chris
Alli Iyabo S
Nanometrics Incorporated
Silicon Valley Patent & Group LLP
Toatley Jr. Gregory J
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