Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-01-17
2006-01-17
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C716S030000, C716S030000
Reexamination Certificate
active
06988016
ABSTRACT:
Setting values of a light exposure and a focus position are set in an exposure process for forming a pattern on a substrate. Pseudo measured dimensions of the pattern are calculated with respect to each of the combinations of the setting values. ED-trees and a plurality of margin curves are calculated based on the pseudo measured dimensions with respect to each of the combinations. A dispersion of a tolerance of the light exposure of the margin curves is calculated at a depth of focus corresponding to a maximum difference in height of the substrate.
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Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Kosowski Alexander
Picard Leo
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